TAILIEUCHUNG - Lithography_2

Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book | Soft Lithography 19 Soft Lithographic Fabrication of Micro Optic and Guided Wave Devices Angel Flores and Michael R. Wang University of Miami . 1. Introduction Since the advent of the laser guided wave and integrated optical devices have attracted significant research interest for use in advanced telecommunication and interconnection systems. Based on the device substrate or material used . silicon LiNaO LiTaO GaAs or polymer different manufacturing techniques have been developed for fabrication of these optical devices. While various methods can effectively produce guided wave devices none have been able to match the high-yield low-cost mass productivity schemes that define the photolithographic technique in the semiconductor industry. For example silicon and silicon dioxide waveguides Bowers et al. 2007 are normally produced through standard photolithographic methods requiring customary thin film deposition sputtering chemical vapor deposition or thermal oxidation UV mask exposure and post dry-etching procedures. Despite their high yields and exceptional cost performance photolithography demands the use of a clean-room facility equipped with elaborate semiconductor manufacturing equipment sputtering machine e-beam evaporator mask aligner reactive-ion etcher to name a few leading to undesirable startup costs and prolonged lead times. Similarly advanced manufacturing schemes derived from semiconductor production methods including epitaxial growth waveguides Brown et al. 1987 experience comparable cost-prohibitive drawbacks. Waveguides fabricated on glass substrates typically rely on an ion-exchange process Ramaswamy Srivastava 1988 that may circumvent some of the equipment overhead required in photolithography. In the ion exchange process the device substrate is placed in a molten cation bath causing the sodium ions in the glass substrate to exchange with one of the cations ie. K Li Cs . The ion alteration raises the local refractive index of the substrate

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