TAILIEUCHUNG - báo cáo hóa học:" Stability of SiNX/SiNX double stack antireflection coating for single crystalline silicon solar cells"

Tham khảo tài liệu 'báo cáo hóa học:" stability of sinx/sinx double stack antireflection coating for single crystalline silicon solar cells"', luận văn - báo cáo phục vụ nhu cầu học tập, nghiên cứu và làm việc hiệu quả | Lee et al. Nanoscale Research Letters 2012 7 50 http content 7 1 50 o Nanoscale Research Letters a SpringerOpen Journal NANO EXPRESS Open Access Stability of SiNX SiNX double stack antireflection coating for single crystalline silicon solar cells Youngseok Lee1 Daeyeong Gong2 Nagarajan Balaji1 Youn-Jung Lee1 and Junsin Yi1 2 Abstract Double stack antireflection coatings have significant advantages over single-layer antireflection coatings due to their broad-range coverage of the solar spectrum. A solar cell with 60-nm 20-nm SiNX H double stack coatings has efficiency while that with a 80-nm SiNX H single coating has efficiency. The improvement of the efficiency is due to the effect of better passivation and better antireflection of the double stack antireflection coating. It is important that SiNX H films have strong resistance against stress factors since they are used as antireflective coating for solar cells. However the tolerance of SiNX H films to external stresses has never been studied. In this paper the stability of SiNX H films prepared by a plasma-enhanced chemical vapor deposition system is studied. The stability tests are conducted using various forms of stress such as prolonged thermal cycle humidity and UV exposure. The heat and damp test was conducted for 100 h maintaining humidity at 85 and applying thermal cycles of rapidly changing temperatures from -20 C to 85 C over 5 h. UV exposure was conducted for 50 h using a 180-W UV lamp. This confirmed that the double stack antireflection coating is stable against external stress. Keywords SiNX PECVD double stack stability temperature humidity test. Background Silicon nitride films are widely used in semiconductor device industries as well as in photovoltaic industries due to their strong durability good dielectric characteristics and resistance against corrosion by water 1 2 . Hydrogenated silicon nitride films can improve reflectance and surface passivation 3 . A .

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