TAILIEUCHUNG - Handbook of algorithms for physical design automation part 74

Handbook of Algorithms for Physical Design Automation part 74 provides a detailed overview of VLSI physical design automation, emphasizing state-of-the-art techniques, trends and improvements that have emerged during the previous decade. After a brief introduction to the modern physical design problem, basic algorithmic techniques, and partitioning, the book discusses significant advances in floorplanning representations and describes recent formulations of the floorplanning problem. The text also addresses issues of placement, net layout and optimization, routing multiple signal nets, manufacturability, physical synthesis, special nets, and designing for specialized technologies. It includes a personal perspective from Ralph Otten as he looks back on. | 712 Handbook of Algorithms for Physical Design Automation FIGURE Pitch curve for lines and spaces under aparticular OAI approach called QUASAR illumination. Without SRAFs certain pitches do not have enough contrast and will not print. SRAF are added to restore the contrast. Adapted from Schellenberg . Capodieci L. and Socha B. Proceedings of the 38th Design Automation Conference ACM New York 2001 pp. 89-92. With permission. Polarization At this time there is a fourth independent variable of the EM field that has not yet been as fully exploited as the other three polarization 73 . For advanced steppers which fill the gap between the last lens element and the wafer with water for the higher angle coupling it allows water immersion FIGURE a Layout with alternating phase-shifted apertures black is opaque left stripe is 0 right stripe 180 and b pupil map of an illumination pattern optimized for this layout c Layout with or a memory cell dark is opaque clear is normal 0 mask transmission and d pupil map of an illumination pattern optimized for this layout. Adapted from Granik Y. J. Microlith. Microfab. Microsyst. 3 509 2004. With permission. Modeling and Computational Lithography 713 steppers 26 anticipation of and compensation for polarization properties of the light is becoming crucial 73-76 . At the time of this writing however although some very creative techniques exploiting polarization have been proposed 77 no definitive polarization-based RET has been demonstrated as practical. Instead polarization is considered in each of the other RETs source illumination mask diffraction and lens pupil transmission. This may change in the future as the polarization issues with advanced immersion lithography become better understood. RET Flow and Computational Lithography No matter what patterning technique is used incorporating the simulation of the corresponding effects requires some care for insertion into an EDA environment. Complete brute .

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